飞行时间二次离子质谱(TOF-SIMS)
WE KNOW HOW™
Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS)
Technical Definition:
TOF-SIMS is a surface analysis technique that focuses a pulsed primary ion beam onto a sample surface, generating secondary ions during sputtering. Analysis of these secondary ions provides molecular, inorganic, and elemental information about surface species. For instance, TOF-SIMS can detect organic contaminants like adsorbed oils at trace levels undetectable by other techniques.
Key Capabilities:
✓ Detects all periodic table elements (including hydrogen)
✓ Provides:
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Mass spectral data
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XY-dimensional imaging
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Z-direction depth profiling
Performance Advantages:
• Extreme surface sensitivity (top 1-3 monolayers)
• Detection limits surpassing XPS and AES by orders of magnitude
• Simultaneous elemental/molecular characterization
EAG Laboratory Expertise:
As the commercial pioneer in TOF-SIMS with 30+ years' experience, EAG delivers:
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World-class data interpretation for complex datasets
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Advanced imaging (μm-scale defects/particles)
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Cluster ion beam analysis for organic materials
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Complementary depth profiling to dynamic SIMS
Typical Applications:
◉ Surface contamination analysis (pump oils, outgassing residues)
◉ Failure investigation (delamination, blistering)
◉ Process monitoring/R&D support
Technical Specifications
Parameter | Performance |
---|---|
Detected Species | Elemental & molecular ions |
Elemental Coverage | Full periodic table + molecular species |
Detection Limit | 10⁷-10¹⁰ atoms/cm² (metals on semiconductors); ~1 ppm bulk |
Depth Resolution | 1-3 monolayers (static); ≤1 nm (profiling) |
Information Depth | <1 nm (static); ≤10 μm (profiling) |
Imaging | Supported (0.2 μm resolution) |
Wafer Handling | Full 200mm wafer capability |
Strengths
✔ Molecular identification of surface compounds
✔ Unparalleled sensitivity (fractional monolayer detection)
✔ Insulator/conductor compatibility
✔ Non-destructive static analysis
✔ GCIB profiling for organic materials
Limitations
▲ Requires standards for quantification
▲ Vacuum compatibility mandatory
▲ Static mode limited to top 1-3 monolayers
▲ Potential contamination artifacts